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The use of high power impulse magnetron sputtering for improved thin film depositions
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics .ORCID iD: 0000-0002-1744-7322
2007 (English)In: International Colloquium on Plasma Processes,2007, 2007Conference paper, Published paper (Other academic)
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2007.
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Natural Sciences
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URN: urn:nbn:se:liu:diva-40670Local ID: 53820OAI: oai:DiVA.org:liu-40670DiVA: diva2:261519
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Invited presentationAvailable from: 2009-10-10 Created: 2009-10-10 Last updated: 2013-10-30

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Helmersson, Ulf

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CiteExportLink to record
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  • apa
  • harvard1
  • ieee
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  • de-DE
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