Enhancement in ellipsometric thin film sensitivity near surface plasmon resonance conditions
2008 (English)In: Physica Status Solidi (a) applications and materials science, ISSN 1862-6300, Vol. 205, no 4, 817-820 p.Article in journal (Refereed) Published
Ellipsometry used in internal reflection mode exhibits enhanced thin film sensitivity if operated close to surface plasmon resonance conditions. Compared to conventional ellipsometry, the changes in the ellipsometric parameter Δ are several orders of magnitude larger. Here, the origin of this large sensitivity is discussed by analysing thin film approximations of the complex reflectance ratio. It is found that the thickness sensitivity in Δ is proportional to the inverse of the difference between the intrinsic and the radiation-induced damping of the surface plasmons.
Place, publisher, year, edition, pages
Wiley-VCH Verlagsgesellschaft, 2008. Vol. 205, no 4, 817-820 p.
IdentifiersURN: urn:nbn:se:liu:diva-42730DOI: 10.1002/pssa.200777899ISI: 000255702600023Local ID: 68442OAI: oai:DiVA.org:liu-42730DiVA: diva2:263587
4th International Conference on Spectroscopic Ellipsometry (ICSE 4), Stockholm, Sweden, 11–15 June 2007