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Enhancement in ellipsometric thin film sensitivity near surface plasmon resonance conditions
Linköping University, Department of Physics, Chemistry and Biology, Applied Optics . Linköping University, The Institute of Technology.ORCID iD: 0000-0001-9229-2028
Linköping University, Department of Physics, Chemistry and Biology, Applied Optics . Linköping University, The Institute of Technology.
Scientific Engineering QED, Linköping, Sweden.
2008 (English)In: Physica Status Solidi (a) applications and materials science, ISSN 1862-6300, E-ISSN 1862-6319, Vol. 205, no 4, 817-820 p.Article in journal (Refereed) Published
Abstract [en]

Ellipsometry used in internal reflection mode exhibits enhanced thin film sensitivity if operated close to surface plasmon resonance conditions. Compared to conventional ellipsometry, the changes in the ellipsometric parameter Δ are several orders of magnitude larger. Here, the origin of this large sensitivity is discussed by analysing thin film approximations of the complex reflectance ratio. It is found that the thickness sensitivity in Δ is proportional to the inverse of the difference between the intrinsic and the radiation-induced damping of the surface plasmons.

Place, publisher, year, edition, pages
Wiley-VCH Verlagsgesellschaft, 2008. Vol. 205, no 4, 817-820 p.
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:liu:diva-42730DOI: 10.1002/pssa.200777899ISI: 000255702600023Local ID: 68442OAI: oai:DiVA.org:liu-42730DiVA: diva2:263587
Conference
4th International Conference on Spectroscopic Ellipsometry (ICSE 4), Stockholm, Sweden, 11–15 June 2007
Available from: 2009-10-10 Created: 2009-10-10 Last updated: 2017-12-13Bibliographically approved

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Arwin, HansPoksinski, Michal

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