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Low-temperature Hysteresis-free Reactive Deposition of Alpha-alumina
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics .
2008 (English)In: 51st SVC Annual Technical Conference,2008, 2008Conference paper (Other academic)
Abstract [en]


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URN: urn:nbn:se:liu:diva-42811Local ID: 69020OAI: diva2:263668
Available from: 2009-10-10 Created: 2009-10-10

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Wallin, Erik
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The Institute of TechnologyPlasma and Coating Physics
Natural Sciences

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