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High Power Impulse Magnetron Sputtering; An Overwiev of History, Properties and Current Status
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics .
2008 (English)In: Nouvelles Tendances en Procedes Magnetron et Arc pour le Depot de Couches Minces New Trends in Magnetron and Arc Processing for Thin Film Deposition,2008, 2008Conference paper, Published paper (Other academic)
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2008.
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Natural Sciences
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URN: urn:nbn:se:liu:diva-42814Local ID: 69023OAI: oai:DiVA.org:liu-42814DiVA, id: diva2:263671
Available from: 2009-10-10 Created: 2009-10-10

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Samuelsson, Mattias

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The Institute of TechnologyPlasma and Coating Physics
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CiteExportLink to record
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Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
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