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Reactive HiPIMS Deposition of TiN and AI2O3
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics .ORCID iD: 0000-0002-1744-7322
2008 (English)In: HIPIMS Days,2008, 2008Conference paper (Other academic)
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URN: urn:nbn:se:liu:diva-42816Local ID: 69025OAI: diva2:263673
Available from: 2009-10-10 Created: 2009-10-10 Last updated: 2013-10-30

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Helmersson, Ulf
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The Institute of TechnologyPlasma and Coating Physics
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