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Hot-wall MOCVD growth and characterization of III-nitrides for HEMT application
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials.
2006 (English)In: WOCSDICE 2006,2006, 2006Conference paper, Published paper (Other academic)
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2006.
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Natural Sciences
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URN: urn:nbn:se:liu:diva-43507Local ID: 73994OAI: oai:DiVA.org:liu-43507DiVA: diva2:264366
Available from: 2009-10-10 Created: 2009-10-10 Last updated: 2010-12-06

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Forsberg, UrbanKakanakova-Georgieva, AneliaIvanov, Ivan GueorguievJanzén, Erik

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