Single-crystal Ti2AlN thin films
2005 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 86, no 11, 111913- p.Article in journal (Refereed) Published
We have produced pure thin-film single-crystal Ti2AlN(0001), a member of the Mn+1AXn class of materials. The method used was UHV dc reactive magnetron sputtering from a 2Ti:Al compound target in a mixed Ar–N2 discharge onto (111) oriented MgO substrates. X-ray diffraction and transmission electron microscopy were used to establish the hexagonal crystal structure with c and a lattice parameters of 13.6 and 3.07 Å, respectively. The hardness H, and elastic modulus E, as determined by nanoindentation measurements, were found to be 16.1±1 GPa and 270±20 GPa, respectively. A room-temperature resistivity for the films of 39 μΩ cm was obtained.
Place, publisher, year, edition, pages
2005. Vol. 86, no 11, 111913- p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-45490DOI: 10.1063/1.1882752OAI: oai:DiVA.org:liu-45490DiVA: diva2:266386