Self-diffusion of 12C and 13C in intrinsic 4H-SiC
2004 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 95, no 12, 8469-8471 p.Article in journal (Refereed) Published
The study of self-diffusion of carbon (12C and 13C) in low-doped (intrinsic) 4H-SiC using secondary ion mass spectroscopy (SIMS) was presented. A two layer 13C enriched structure with 13C/12C ratios of 0.01 and 0.1, respectively, was prepared by using vapor phase epitaxy. The subsequent anneals were carried out in Ar atmosphere in a rf heated furnace between 2100 and 2350°C for 15 min-40 h. A small variation in the enriched 13C concentration and in the layer thickness over the wafer was also presented.
Place, publisher, year, edition, pages
2004. Vol. 95, no 12, 8469-8471 p.
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-45712DOI: 10.1063/1.1751229OAI: oai:DiVA.org:liu-45712DiVA: diva2:266608