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Optical constants of vacuum evaporated SiO film and an application
National Institute of Advanced Industrial Science and Technology, Shidami, Moriyama-ku, Nagoya .
National Institute of Advanced Industrial Science and Technology, Shidami, Moriyama-ku, Nagoya .
National Institute of Advanced Industrial Science and Technology, Shidami, Moriyama-ku, Nagoya .
National Institute of Advanced Industrial Science and Technology, Shidami, Moriyama-ku, Nagoya .
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2006 (English)In: Journal of Electroceramics, ISSN 1385-3449, E-ISSN 1573-8663, Vol. 16, no 4, p. 511-515Article in journal (Refereed) Published
Abstract [en]

Silicon monoxide films were deposited on silver films on glass substrates and studied by infrared ellipsometry to determine the optical properties in the infrared wavelength range from 1.3 to 40 micrometers. The thicknesses of silicon monoxide and aluminum films were designed to 1 micrometer and 200 nanometers, respectively. The ellipsometric measurements were carried out by using a spectro-ellipsometer attached with an FT-IR. The imaginary part of the refractive index shows a high absorption region which is centered at 10 micrometers, whereas in other wavelength regions it shows rather low absorption. The resultant optical properties of silicon monoxide film are compared with published data. As an application, the spectral reflectance of spectral selective panel heating surface is calculated.

Place, publisher, year, edition, pages
2006. Vol. 16, no 4, p. 511-515
Keywords [en]
silicon monoxide, infrared, ellipsometry, refractive index, optical constants
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-45985DOI: 10.1007/s10832-006-9908-yOAI: oai:DiVA.org:liu-45985DiVA, id: diva2:266881
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

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Arwin, Hans

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