liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Microstructure and thermal stability of arc-evaporated Cr-C-N coatings
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Nanostructured Materials .ORCID iD: 0000-0002-2286-5588
2004 (English)In: PHILOSOPHICAL MAGAZINE, ISSN 1478-6443, Vol. 84, no 7, 611-630 p.Article in journal (Refereed) Published
Abstract [en]

The role of C incorporation in the microstructure and thermal stability of arc-evaporated Cr-C-N coatings is explored via reactive growth in a mixed C2H4-N-2 environment. C is found to react more readily than N at both the Cr cathode and the coating surfaces, so that a C2H4-to-N-2 flow ratio of only 1% yields a C-to-N ratio of approximately 10% within the coatings. The as-deposited microstructures consist primarily of the delta-Cr(C, N) phase and possess high compressive residual stresses, which decrease with increasing C content. Post-deposition annealing up to 700degreesC results in depletion of lattice defects, and concomitant reductions in stress and coating hardness, together with phase transformations which suggest metastable phase formation during growth. Apparent activation energies for this lattice defect are found to be in the range expected for bulk diffusion of N and C (2.4-2.8 eV). The results suggest that inclusion of small amounts of C in this system offers the ability to reduce internal stresses while maintaining defect-related hardness increases, permitting growth of thicker and thus more wear-resistant coatings.

Place, publisher, year, edition, pages
2004. Vol. 84, no 7, 611-630 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-46285DOI: 10.1080/14786430310001646727OAI: oai:DiVA.org:liu-46285DiVA: diva2:267181
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2013-10-02

Open Access in DiVA

No full text

Other links

Publisher's full text

Authority records BETA

Odén, Magnus

Search in DiVA

By author/editor
Odén, Magnus
By organisation
The Institute of TechnologyNanostructured Materials
Engineering and Technology

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 80 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf