liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Diagnostics of a N2/Ar direct current magnetron discharge for reactive sputter deposition of fullerene-like carbon nitride thin films
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.ORCID iD: 0000-0002-2837-3656
Inst. for Ion Beam Phys./Mat. Res., Forschungszentrum Rossendorf, PF 510119, 01314 Dresden, Germany.
Inst. for Ion Beam Phys./Mat. Res., Forschungszentrum Rossendorf, PF 510119, 01314 Dresden, Germany.
Show others and affiliations
2003 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 94, no 11, 7059-7066 p.Article in journal (Refereed) Published
Abstract [en]

Composition and energetic conditions of the ion flux of a direct current, N2/Ar, unbalanced magnetron sputtering plasma in front of ionized film-forming species were investigated. Plasma probe measurements and energy selective mass spectrometry were used. The results show that the total number of C-containing ions strongly depends on the N2 fraction in the discharge. It was also found that C and N atoms and ions are important during growth of fullerene-like (FL) carbon nitride (CNx) thin films.

Place, publisher, year, edition, pages
2003. Vol. 94, no 11, 7059-7066 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-46371DOI: 10.1063/1.1625091OAI: oai:DiVA.org:liu-46371DiVA: diva2:267267
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

Open Access in DiVA

No full text

Other links

Publisher's full text

Authority records BETA

Neidhardt, JörgHultman, Lars

Search in DiVA

By author/editor
Neidhardt, JörgHultman, Lars
By organisation
The Institute of TechnologyThin Film Physics
In the same journal
Journal of Applied Physics
Engineering and Technology

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 202 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf