Diagnostics of a N2/Ar direct current magnetron discharge for reactive sputter deposition of fullerene-like carbon nitride thin films
2003 (English)In: Journal of Applied Physics, ISSN 0021-8979, Vol. 94, no 11, 7059-7066 p.Article in journal (Refereed) Published
Composition and energetic conditions of the ion flux of a direct current, N2/Ar, unbalanced magnetron sputtering plasma in front of ionized film-forming species were investigated. Plasma probe measurements and energy selective mass spectrometry were used. The results show that the total number of C-containing ions strongly depends on the N2 fraction in the discharge. It was also found that C and N atoms and ions are important during growth of fullerene-like (FL) carbon nitride (CNx) thin films.
Place, publisher, year, edition, pages
2003. Vol. 94, no 11, 7059-7066 p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-46371DOI: 10.1063/1.1625091OAI: oai:DiVA.org:liu-46371DiVA: diva2:267267