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Penetration and loading of human serum albumin in porous silicon layers with different pore sizes and thicknesses
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Applied Physics.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Applied Physics.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Applied Optics .ORCID iD: 0000-0001-9229-2028
2003 (English)In: Journal of Colloid and Interface Science, ISSN 0021-9797, E-ISSN 1095-7103, Vol. 266, no 1, 40-47 p.Article in journal (Refereed) Published
Abstract [en]

Human serum albumin was adsorbed into porous silicon layers with thickness up to 3 µm and with different mean pore radius in the range 4.5-10 nm. The adsorbed amount of protein was quantified by I125 radioactive labeling techniques and ellipsometry. The results show that albumin penetrated into the pores when the mean pore radius was larger than 5.5 nm, but could not totally occupy the available surface area when the layer thickness was larger than 1 µm. Loading of albumin both into porous layers and onto plane silicon as a function of albumin concentration was also investigated. These measurements show that loading of protein increased with protein concentration at least up to 10 mg/ml for porous silicon and up to 1 mg/ml for plane silicon. The maximum deposition into the type of porous layers used here was 28 µg/cm2, compared to 0.36 µg/cm2 for plane silicon. © 2003 Elsevier Inc. All rights reserved.

Place, publisher, year, edition, pages
2003. Vol. 266, no 1, 40-47 p.
Keyword [en]
Ellipsometry, Human serum albumin, Porous silicon, Protein adsorption, Protein loading, Protein penetration
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-46472DOI: 10.1016/S0021-9797(03)00595-2OAI: oai:DiVA.org:liu-46472DiVA: diva2:267368
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

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Tengvall, PenttiLundström, IngemarArwin, Hans

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