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Dislocation loops formed during the degradation of forward-biased 4H-SiC p-n junctions
Department of Materials Science, Stt. Univ. New York at Stony Brook, Stony Brook, NY 11794-2275, United States.
Department of Materials Science, Carnegie Mellon University, Pittsburgh, PA 15213-3890, United States.
Department of Materials Science, Stt. Univ. New York at Stony Brook, Stony Brook, NY 11794-2275, United States.
Department of Materials Science, Carnegie Mellon University, Pittsburgh, PA 15213-3890, United States.
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2003 (English)In: Materials Science & Engineering: B. Solid-state Materials for Advanced Technology, ISSN 0921-5107, E-ISSN 1873-4944, Vol. 98, no 3, p. 220-224Article in journal (Refereed) Published
Abstract [en]

The partial dislocations that border triangle or parallelogram-shaped stacking faults formed during the degradation of p-n diodes fabricated on 4H-SiC wafers were determined by transmission X-ray topography to be dislocation loops of Burgers vector 1/3<101¯0>, the Shockley partial type, consistent with previously reported TEM results. Some were separated from axial screw dislocations also present in the sample, indicating that the axial dislocations were not involved in the loops' nucleation, while others were seen to have interacted during their growth with the axial screw dislocations, distorting their shapes from those of ideal parallelograms. © 2003 Elsevier Science B.V. All rights reserved.

Place, publisher, year, edition, pages
2003. Vol. 98, no 3, p. 220-224
Keywords [en]
Device degradation, Diodes, Dislocation loops, Silicon carbide crystals, X-ray topography
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-46663DOI: 10.1016/S0921-5107(03)00040-0OAI: oai:DiVA.org:liu-46663DiVA, id: diva2:267559
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

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Hallin, Christer

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The Institute of TechnologyDepartment of Physics, Chemistry and Biology
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