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Back-side etching A tool for making morphology gradients in porous silicon
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Applied Physics.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Applied Physics.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Applied Optics .ORCID iD: 0000-0001-9229-2028
2002 (English)In: Journal of the Electrochemical Society, ISSN 0013-4651, E-ISSN 1945-7111, Vol. 149, no 12Article in journal (Refereed) Published
Abstract [en]

A new method for preparing morphology gradients in electrochemically etched porous silicon layers in presented. The idea is to etch on the back side of the anode and thus utilize and inhomogenous electric field to control the pore size along a surface. The etching procedure resulted in a complex gradient in pore size, porosity, and porous layer thickness, which was studied by spectroscopic ellipsometry and scanning electron microscopy. The gradients are of interest, e.g., for biomaterials research, bio-sensor applications, and for basic studies of adsorption of organic molecules, like proteins. In order to investigate the potential of the gradient surfaces for protein adsorption studies, these were exposed to human serum albumin, and a gradient in the amount of adsorbed protein was observed.

Place, publisher, year, edition, pages
2002. Vol. 149, no 12
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-46823DOI: 10.1149/1.1519851OAI: oai:DiVA.org:liu-46823DiVA: diva2:267719
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

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Tengvall, PenttiLundström, IngemarArwin, Hans

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