Low temperature deposition of a-Al2O3 thin films by sputtering using a Cr2O3 template
2002 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, Vol. 20, no 6, 2134-2136 p.Article in journal (Refereed) Published
A description about low temperature deposition of a-Al2O3 thin films by sputtering was presented. Cr2O3 thin layer was used as a template. Nanoindentation was used to study the mechanical properties of the deposited films. Calculations were made to obtain the hardness and Young's modulus of the films.
Place, publisher, year, edition, pages
2002. Vol. 20, no 6, 2134-2136 p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-46873DOI: 10.1116/1.1513641OAI: oai:DiVA.org:liu-46873DiVA: diva2:267769