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Low temperature deposition of a-Al2O3 thin films by sputtering using a Cr2O3 template
National Institute of AIST, 2266-98 Anagahora, Shimoshidami, Nagoya, 463-8560, Japan.
National Institute of AIST, 2266-98 Anagahora, Shimoshidami, Nagoya, 463-8560, Japan.
National Institute of AIST, 2266-98 Anagahora, Shimoshidami, Nagoya, 463-8560, Japan.
National Institute of AIST, 2266-98 Anagahora, Shimoshidami, Nagoya, 463-8560, Japan.
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2002 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 20, no 6, 2134-2136 p.Article in journal (Refereed) Published
Abstract [en]

A description about low temperature deposition of a-Al2O3 thin films by sputtering was presented. Cr2O3 thin layer was used as a template. Nanoindentation was used to study the mechanical properties of the deposited films. Calculations were made to obtain the hardness and Young's modulus of the films.

Place, publisher, year, edition, pages
2002. Vol. 20, no 6, 2134-2136 p.
National Category
Engineering and Technology
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URN: urn:nbn:se:liu:diva-46873DOI: 10.1116/1.1513641OAI: oai:DiVA.org:liu-46873DiVA: diva2:267769
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

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Music, DenisAlami, JonesHelmersson, Ulf

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Music, DenisAlami, JonesHelmersson, Ulf
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Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
Engineering and Technology

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