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Plasma characterization during laser ablation of graphite in nitrogen for the growth of fullerene-like CNx films
Voevodin, A.A.
MLBT, Air Force Research Laboratory, Materials and Manufacturing Directorate, Dayton, OH 45433-7750, United States.
Jones, J.G.
MLBT, Air Force Research Laboratory, Materials and Manufacturing Directorate, Dayton, OH 45433-7750, United States.
Zabinski, J.S.
MLBT, Air Force Research Laboratory, Materials and Manufacturing Directorate, Dayton, OH 45433-7750, United States.
Hultman, Lars
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.
ORCID iD:
0000-0002-2837-3656
2002 (English)
In:
Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 92, no 2, p. 724-
Article in journal (Refereed) Published
Abstract [en]
[No abstract available]
Place, publisher, year, edition, pages
2002. Vol. 92, no 2, p. 724-
National Category
Engineering and Technology
Identifiers
URN:
urn:nbn:se:liu:diva-46948
DOI:
10.1063/1.1481972
OAI: oai:DiVA.org:liu-46948
DiVA, id:
diva2:267844
Available from:
2009-10-11
Created:
2009-10-11
Last updated:
2017-12-13
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Hultman, Lars
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