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Plasma characterization during laser ablation of graphite in nitrogen for the growth of fullerene-like CNx films
MLBT, Air Force Research Laboratory, Materials and Manufacturing Directorate, Dayton, OH 45433-7750, United States.
MLBT, Air Force Research Laboratory, Materials and Manufacturing Directorate, Dayton, OH 45433-7750, United States.
MLBT, Air Force Research Laboratory, Materials and Manufacturing Directorate, Dayton, OH 45433-7750, United States.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.ORCID iD: 0000-0002-2837-3656
2002 (English)In: Journal of Applied Physics, ISSN 0021-8979, Vol. 92, no 2, 724- p.Article in journal (Refereed) Published
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2002. Vol. 92, no 2, 724- p.
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Engineering and Technology
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URN: urn:nbn:se:liu:diva-46948DOI: 10.1063/1.1481972OAI: oai:DiVA.org:liu-46948DiVA: diva2:267844
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2016-08-31

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Hultman, Lars

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