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Modification of vapor sensitivity in ellipsometric gas sensing by copper deposition in porous silicon
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Applied Optics .ORCID iD: 0000-0001-9229-2028
2002 (English)In: Sensors and actuators. B, Chemical, ISSN 0925-4005, E-ISSN 1873-3077, Vol. 85, no 1-2, 95-103 p.Article in journal (Refereed) Published
Abstract [en]

The sensitivities of porous silicon layers modified by copper deposition to low vapor concentrations of methanol, ethanol and 2-propanol are studied with spectroscopic ellipsometry. The porous silicon layers are prepared with electrochemical etching in hydrofluoric acid, and copper deposition is done in aqueous CuSO4. The ellipsometric vapor sensitivities, in terms of the ellipsometric spectral shifts due to gas exposures, of these samples and their oxides are studied and compared. It is shown that ellipsometric vapor sensitivities of porous silicon layers to alcohols are improved by copper deposition. It is also found that the oxidation of copper deposited in porous silicon layers shows improved selectivity to methanol. © 2002 Elsevier Science B.V. All rights reserved.

Place, publisher, year, edition, pages
2002. Vol. 85, no 1-2, 95-103 p.
Keyword [en]
Alcohols, Copper deposition, Ellipsometric gas sensitivity, Porous silicon
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-46969DOI: 10.1016/S0925-4005(02)00059-XOAI: oai:DiVA.org:liu-46969DiVA: diva2:267865
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

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Wang, GuoliangArwin, Hans

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