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Characteristics of SrTiO3 thin films deposited on Si by rf magnetron sputtering at various substrate temperatures
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics .ORCID iD: 0000-0002-1744-7322
Applied Physics Laboratory, Department of Physics, University of Ioannina, 451 10 Ioannina, Greece.
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2002 (English)In: Philosophical Magazine B, ISSN 1364-2812, Vol. 82, no 8, 891-903 p.Article in journal (Refereed) Published
Abstract [en]

SrTiO3 (STO) thin films were deposited on p-type Si(100) substrates by rf magnetron sputtering at various substrate temperatures, and their structural and electrical properties were investigated without post-deposition annealing. The thickness of the films was in the range from 300 to 500 nm while the deposition temperature was varied between room temperature and 550°C. Compositional and structural characterizations included X-ray diffraction, Rutherford back-scattering spectroscopy and variable-angle spectroscopic ellipsometry. Metal-insulator-semiconductor diodes with the configuration of Al/STO/p-Si/Al were fabricated and characterized by capacitance-voltage, current voltage and admittance spectroscopy measurements. Depending on the substrate temperatures, the dielectric constant of the films varied between 60 and 120 and the loss factor between 0.019 and 0.051 at 100 kHz. All films showed high charge storage capacity, varying between 1.9 and 3 µm cm-2. However, the films deposited at 200°C showed the lowest density of bulk trapped charges (150nC cm-2) and interface states ((1.2-6.1) × 1011 cm-2 eV-1), and are therefore considered to be the most suitable for device applications.

Place, publisher, year, edition, pages
2002. Vol. 82, no 8, 891-903 p.
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Engineering and Technology
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URN: urn:nbn:se:liu:diva-47003DOI: 10.1080/13642810110106006OAI: oai:DiVA.org:liu-47003DiVA: diva2:267899
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2013-10-30

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Kugler, Veronika MozhdehHelmersson, Ulf

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Kugler, Veronika MozhdehHelmersson, Ulf
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