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Chemical bonding in carbon nitride films studied by X-ray spectroscopies
Department of Materials Science and National Key Laboratory of Superhard Materials, Jilin University, Changchun 130023, China, Department of Precision Engineering, Chiba Institute of Technology, 2-17-1 Tsudanuma, Narashino 275-0016, Japan, Department of Physics, Linkoping University, S-581 83 Linkoping, Sweden, National Key Laboratory of Materials Surface Modification by Laser, Ion, and Electron, Dalian University of Technology, Dalian 116024, China.
Department of Physics, Uppsala University, Box 530, 751 21 Uppsala, Sweden.
Department of Precision Engineering, Chiba Institute of Technology, 2-17-1 Tsudanuma, Narashino 275-0016, Japan.
Department of Precision Engineering, Chiba Institute of Technology, 2-17-1 Tsudanuma, Narashino 275-0016, Japan.
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2001 (English)In: Diamond and related materials, ISSN 0925-9635, Vol. 10, no 9-10, 1897-1900 p.Article in journal (Refereed) Published
Abstract [en]

Carbon nitride films are deposited using dc magnetron sputtering in a N2 discharge. The nature of chemical bonding of the films is investigated using X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure, and X-ray emission spectroscopy. X-Ray photoelectron spectroscopy spectra show that N1s binding states depend on substrate temperature, in which two pronounced peaks can be observed. The near edge X-ray absorption fine structure at C1s and N1s exhibits a similar absorption profile in the p* resonance region, but the s* resonance is sharper in the N1s spectra. Resonant N K-emission spectra show a strong dependence on excitation photo energies. Compared XPS N1s spectra with recent theoretical calculations by Johansson and Stafstrom, two main nitrogen sites are assigned in which N bound to sp3 hybridized C and sp2 hybridized C, respectively. The correlation of X-ray photoelectron, X-ray absorption, and X-ray emission spectra for N in carbon nitride films is also discussed. © 2001 Elsevier Science B.V. All rights reserved.

Place, publisher, year, edition, pages
2001. Vol. 10, no 9-10, 1897-1900 p.
Keyword [en]
Carbon nitride film, Chemical bonding, Magnetron sputtering, X-ray spectroscopies
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:liu:diva-47272DOI: 10.1016/S0925-9635(01)00432-0OAI: oai:DiVA.org:liu-47272DiVA: diva2:268168
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2011-01-13

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