Chemical bonding in carbon nitride films studied by X-ray spectroscopies
2001 (English)In: Diamond and related materials, ISSN 0925-9635, Vol. 10, no 9-10, 1897-1900 p.Article in journal (Refereed) Published
Carbon nitride films are deposited using dc magnetron sputtering in a N2 discharge. The nature of chemical bonding of the films is investigated using X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure, and X-ray emission spectroscopy. X-Ray photoelectron spectroscopy spectra show that N1s binding states depend on substrate temperature, in which two pronounced peaks can be observed. The near edge X-ray absorption fine structure at C1s and N1s exhibits a similar absorption profile in the p* resonance region, but the s* resonance is sharper in the N1s spectra. Resonant N K-emission spectra show a strong dependence on excitation photo energies. Compared XPS N1s spectra with recent theoretical calculations by Johansson and Stafstrom, two main nitrogen sites are assigned in which N bound to sp3 hybridized C and sp2 hybridized C, respectively. The correlation of X-ray photoelectron, X-ray absorption, and X-ray emission spectra for N in carbon nitride films is also discussed. © 2001 Elsevier Science B.V. All rights reserved.
Place, publisher, year, edition, pages
2001. Vol. 10, no 9-10, 1897-1900 p.
Carbon nitride film, Chemical bonding, Magnetron sputtering, X-ray spectroscopies
IdentifiersURN: urn:nbn:se:liu:diva-47272DOI: 10.1016/S0925-9635(01)00432-0OAI: oai:DiVA.org:liu-47272DiVA: diva2:268168