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Anisotropies in magnetron sputtered carbon nitride thin films
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.ORCID iD: 0000-0002-2837-3656
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2001 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 78, no 18, 2703-2705 p.Article in journal (Refereed) Published
Abstract [en]

Carbon nitride CNx (O=x=0.35) thin films, deposited by reactive dc magnetron sputtering in Ar/N2 discharges have been studied with respect to microstructure using electron microscopy, and elastic modulus using nanoindentation and surface acoustic wave analyses. For growth temperature of 100°C, the films were amorphous, and with an isotropic Young's modulus of ~170-200 GPa essentially unaffected by the nitrogen fraction. The films grown at elevated temperatures (350-550°C) show anisotropic mechanical properties due to a textured microstructure with standing basal planes, as observed from measuring the Young's modulus in different directions. The modulus measured in the plane of the film was ~60-80 GPa, while in the vertical direction the modulus increased considerably from ~25 to ~200 GPa as the nitrogen content was increased above ~15 at. %. © 2001 American Institute of Physics.

Place, publisher, year, edition, pages
2001. Vol. 78, no 18, 2703-2705 p.
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Engineering and Technology
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URN: urn:nbn:se:liu:diva-47403DOI: 10.1063/1.1369388OAI: oai:DiVA.org:liu-47403DiVA: diva2:268299
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

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Hultman, Lars

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