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Carrier lifetime investigation in 4H-SiC grown by CVD and sublimation epitaxy
Dept. of Solid State Electronics, Roy. Inst. Technol., E., Kista-Stockholm, Sweden.
Dept. of Solid State Electronics, Roy. Inst. Technol., E., Kista-Stockholm, Sweden.
Dept. of Solid State Electronics, Roy. Inst. Technol., E., Kista-Stockholm, Sweden.
Linköping University, Department of Physics, Chemistry and Biology, Semiconductor Materials. Linköping University, The Institute of Technology.
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2001 (English)In: Materials Science in Semiconductor Processing, Vol. 4, 2001, Vol. 4, no 1-3, 191-194 p.Conference paper, Published paper (Refereed)
Abstract [en]

Depth-resolved carrier lifetime measurements were performed in low-doped epitaxial layers of 4H silicon carbide samples. The technique used was a pump-and-probe technique where carriers are excited by an above-bandgap laser pulse and probed by free carrier absorption. Results from chemical vapour deposition samples show that lifetimes as high as 2 µs may be observed in the mid-region of 40 µm thick epilayers. For epilayers grown by the sublimation method decay transients were characterized by a fast (few nanoseconds) initial recombination, tentatively assigned to the `true' lifetime, whereas a slow tail of several hundred microsecond decay time was assigned to trapping centres. From the saturation of this level at increased pumping we could derive the trapping concentration and their depth distribution peaking at the epilayer/substrate interface.

Place, publisher, year, edition, pages
2001. Vol. 4, no 1-3, 191-194 p.
Series
Materials Science in Semiconductor Processing, ISSN 1369-8001 ; 1-3
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-47474DOI: 10.1016/S1369-8001(00)00133-5OAI: oai:DiVA.org:liu-47474DiVA: diva2:268370
Conference
E-MRS 2000 Spring meeting, 30 May - 2 June 2000, Strasbourg, France
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2015-06-02

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Syväjärvi, MikaelYakimova, Rositsa

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