Single-crystal growth of NaCl-structure Al-Cr-N thin films on MgO(0 0 1) by magnetron sputter epitaxy
2007 (English)In: Scripta Materialia, ISSN 1359-6462, Vol. 57, no 12, 1089-1092 p.Article in journal (Refereed) Published
Single-crystal NaCl-structure Al0.68Cr0.32N thin films were deposited onto MgO(0 0 1) substrates. The films exhibit cube-on-cube epitaxial growth with an initial pseudomorphic strained layer before complete relaxation into an isotropic lattice parameter of 4.119 Å as shown by symmetric high-resolution X-ray diffraction and asymmetric reciprocal space maps. The relaxation proceeds via a threading dislocation network as revealed by transmission electron microscopy. Films of 900 nm thickness have a hardness of 32.4 ± 0.5 GPa, an elastic modulus of 460.8 ± 5 GPa, and a room-temperature resistivity of 2.7 × 103 O cm as determined by nanoindentation and four-point probe measurements, respectively. © 2007 Acta Materialia Inc.
Place, publisher, year, edition, pages
2007. Vol. 57, no 12, 1089-1092 p.
CrAlN, Nanoindentation, Single-crystal growth, Transmission electron microscopy, X-ray diffraction
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-47477DOI: 10.1016/j.scriptamat.2007.08.027OAI: oai:DiVA.org:liu-47477DiVA: diva2:268373