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Electrical and optical properties of CNx(0=x=0.25) films deposited by reactive magnetron sputtering
Linköping University, The Institute of Technology.ORCID iD: 0000-0003-2749-8008
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2001 (English)In: Journal of Applied Physics, ISSN 0021-8979, Vol. 89, no 2, 1184-1190 p.Article in journal (Refereed) Published
Abstract [en]

The electrical and optical properties of carbon-nitride CNx films (O=x=0.25) deposited by unbalanced reactive magnetron sputtering from a graphite target in mixed Ar/N2 discharges at a substrate temperature of 350°C have been investigated. Pure C films exhibit a dark conductivity at room temperature of 250 O-1 cm-1, which grows up to 250 O-1 cm-1 for CNx films with N content of 20%. For CNx films, temperature-dependent conductivity measurements suggest that two electron conduction processes exist in the investigated temperature range 130

Place, publisher, year, edition, pages
2001. Vol. 89, no 2, 1184-1190 p.
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Engineering and Technology
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URN: urn:nbn:se:liu:diva-47482DOI: 10.1063/1.1334370OAI: oai:DiVA.org:liu-47482DiVA: diva2:268378
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2016-08-31

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Järrendahl, KennethHultman, Lars

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