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Chemical bonding, structure, and hardness of carbon nitride thin films
Department of Materials Science, Jilin University, Changchun 130023, China, State Key Laboratory of Superhard Materials, Jilin University, Changchun 130023, China, National Key Laboratory of Ion, Electron, Laser Modification, Da Lian Science and Technology University, Dalian 116024, China.
Department of Materials Science, Jilin University, Changchun 130023, China.
Department of Materials Science, Jilin University, Changchun 130023, China.
Department of Materials Science, Jilin University, Changchun 130023, China.
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2000 (English)In: Diamond and related materials, ISSN 0925-9635, E-ISSN 1879-0062, Vol. 9, no 9-10, 1790-1794 p.Conference paper, Published paper (Other academic)
Abstract [en]

Carbon nitride films are deposited on Si(001) substrates by reactive d.c. magnetron sputtering graphite in a pure N2 discharge. The chemical bonding and structure of carbon nitride films were probed using Fourier transformation infrared (FTIR) and near edge X-ray absorption fine structure (NEXAFS), and the hardness was evaluated using nanoindentation experiments. The structure and hardness for the films are dependent on the substrate temperature (T(s)). FTIR and NEXAFS spectra show that N atoms are bound to sp1, sp2 and sp3 hybridized C atoms, and the intensity of p(*) resonance for C1s NEXAFS spectra is the lowest for the film grown at T(s) = 350°C, having a turbostratic-like structure, high hardness and stress. The correlation between the structure and hardness of carbon nitride films is discussed. (C) 2000 Elsevier Science S.A. All rights reserved.Carbon nitride films are deposited on Si(001) substrates by reactive d.c. magnetron sputtering graphite in a pure N2 discharge. The chemical bonding and structure of carbon nitride films were probed using Fourier transformation infrared (FTIR) and near edge X-ray absorption fine structure (NEXAFS), and the hardness was evaluated using nanoindentation experiments. The structure and hardness for the films are dependent on the substrate temperature (Ts). FTIR and NEXAFS spectra show that N atoms are bound to sp1, sp2 and sp3 hybridized C atoms, and the intensity of p* resonance for C1s NEXAFS spectra is the lowest for the film grown at Ts = 350°C, having a turbostratic-like structure, high hardness and stress. The correlation between the structure and hardness of carbon nitride films is discussed.

Place, publisher, year, edition, pages
2000. Vol. 9, no 9-10, 1790-1794 p.
National Category
Natural Sciences
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URN: urn:nbn:se:liu:diva-47592DOI: 10.1016/S0925-9635(00)00314-9OAI: oai:DiVA.org:liu-47592DiVA: diva2:268488
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-13

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