Growth, structure, and mechanical properties of CNxHy films deposited by dc magnetron sputtering in N2/Ar/H2 discharges
2000 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, Vol. 18, no 5, 2349-2358 p.Article in journal (Refereed) Published
Reactive direct current magnetron sputtering was used to deposit the hydrogenated carbon nitride films in mixed nitrogen (N2)/argon (Ar)/ hydrogen (H2) discharges. Growth and structure evolution of films was found to be affected by chemical sputtering effects. The hydrogen were found to be bonded to nitrogen and hydrogen incorporation decreases the elasticity and hardness.
Place, publisher, year, edition, pages
2000. Vol. 18, no 5, 2349-2358 p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-47595DOI: 10.1116/1.1286395OAI: oai:DiVA.org:liu-47595DiVA: diva2:268491