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Growth, structure, and mechanical properties of CNxHy films deposited by dc magnetron sputtering in N2/Ar/H2 discharges
Hjörvarsson, B., Materials Physics, Royal Institute of Technology, Teknikringen 14, S-100 44 Stockholm, Sweden.
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2000 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, Vol. 18, no 5, 2349-2358 p.Article in journal (Refereed) Published
Abstract [en]

Reactive direct current magnetron sputtering was used to deposit the hydrogenated carbon nitride films in mixed nitrogen (N2)/argon (Ar)/ hydrogen (H2) discharges. Growth and structure evolution of films was found to be affected by chemical sputtering effects. The hydrogen were found to be bonded to nitrogen and hydrogen incorporation decreases the elasticity and hardness.

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2000. Vol. 18, no 5, 2349-2358 p.
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Engineering and Technology
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URN: urn:nbn:se:liu:diva-47595DOI: 10.1116/1.1286395OAI: oai:DiVA.org:liu-47595DiVA: diva2:268491
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2016-08-31

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Östblom, MattiasLiedberg, BoHultman, Lars

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Östblom, MattiasLiedberg, BoHultman, Lars
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The Institute of TechnologySensor Science and Molecular Physics Thin Film Physics
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Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
Engineering and Technology

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