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Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Plasma and Coating Physics .ORCID iD: 0000-0002-1744-7322
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2000 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, Vol. 18, no 4 II, 1533-1537 p.Article in journal (Refereed) Published
Abstract [en]

A high power density pulsed plasma discharge for ionized sputter deposition is studied. The temporal evolution of the plasma ion composition in high power pulsed magnetron sputtering is investigated and shows that Ar ions dominated the beginning of the pulse. As time elapsed, metal ions are detected and finally dominated the ion composition.

Place, publisher, year, edition, pages
2000. Vol. 18, no 4 II, 1533-1537 p.
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Engineering and Technology
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URN: urn:nbn:se:liu:diva-47629DOI: 10.1116/1.582380OAI: oai:DiVA.org:liu-47629DiVA: diva2:268525
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2013-10-30

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Schneider, JochenHelmersson, Ulf

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Schneider, JochenHelmersson, Ulf
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The Institute of TechnologyDepartment of Physics, Chemistry and BiologyPlasma and Coating Physics
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Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
Engineering and Technology

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