Comment on "Pulsed laser deposition and properties of M(n+1)AX(x) phase formulated Ti3SiC2 thin films''
2004 (English)In: Tribology letters, ISSN 1023-8883, E-ISSN 1573-2711, Vol. 17, no 4, 977-978 p.977-978 p.Article in journal, Editorial material (Other academic) Published
A recent paper by Hu et al. claimed synthesis of the MAX-phase Ti3SiC2 at 100 - 300 degreesC using pulsed laser deposition. In this comment, we find that the evidence presented by Hu et al. is insufficient to show Ti3SiC2 formation. In fact, there is a simpler interpretation of their results from X-ray diffraction and transmission electron microscopy, namely that the material produced is a cubic TiC-based compound.
Place, publisher, year, edition, pages
2004. Vol. 17, no 4, 977-978 p.977-978 p.
Ti3SiC2, MAX phase, titanium carbide, thin films, pulsed laser deposition, X-ray diffraction, transmission electron microscopy
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-48248DOI: 10.1007/s11249-004-8112-yOAI: oai:DiVA.org:liu-48248DiVA: diva2:269144