Radiative recombination in In0.15Ga0.85N/GaN multiple quantum well structures
1999 (English)In: MRS Internet journal of nitride semiconductor research, ISSN 1092-5783, Vol. 4, no 16Article in journal (Refereed) Published
We present a study of the radiative recombination in In0.15Ga0.85N/GaN multiple quantum well samples, where the conditions of growth of the InGaN quantum layers were varied in terms of growth temperature (< 800 degrees C) and donor doping. The photoluminescence peak position varies strongly (over a range as large as 0.3 eV) with delay time after pulsed excitation, but also with donor doping and with excitation intensity. The peak position is mainly determined by the Stark effect induced by the piezoelectric field. In addition potential fluctuations, originating from segregation effects in the InGaN material, from interface roughness, and the strain fluctuations related to these phenomena, play an important role, and largely determine the width of the emission. These potential fluctuations may be as large as 0.2 eV in the present samples, and appear to be important for all studied growth temperatures for the InGaN layers. Screening effects from donor electrons and excited electron-hole pairs are important, and account for a large part of the spectral shift with donor doping (an upward shift of the photoluminescence peak up to 0.2 eV is observed for a Si donor density of 2 x 10(18) cm(-3) in the well), with excitation intensity and with delay time after pulsed excitation (also shifts up to 0.2 eV). We suggest a two-dimensional model for electron- and donor screening in this case, which is in reasonable agreement with the observed data, if rather strong localization potentials of short range (of the order 100 Angstrom) are present. The possibility that excitons as well as shallow donors are impact ionized by electrons in the rather strong lateral potential fluctuations present at this In composition is discussed.
Place, publisher, year, edition, pages
1999. Vol. 4, no 16
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-48379OAI: oai:DiVA.org:liu-48379DiVA: diva2:269275