D-II PL intensity dependence on dose, implantation temperature and implanted species in 4H-and 6H-SiC
2003 (English)In: Materials Science Forum, Vols. 433-436, 2003, Vol. 433-4, 345-348 p.Conference paper (Refereed)
In most semi-conductor processing ion implantation is a key technology. The drawback of ion implantation is that a great deal of lattice defects, such as vacancies, interstitials, anti sites and complexes, are introduced. The annealing behaviour of these defects is important for the viability of ion implantation as a commonly used method. In SiC a defect that is only seen after ion implantation and not after irradiation with neutrons or electrons is the D-II defect. The use of Si or C as implanted species have made it possible to investigate the D-II photoluminescence (PL) intensity dependence on an excess of either of the two constituents in SiC. The effect of performing a hot implant at 600degreesC compared to a room temperature implant was also looked into. The D-II PL intensity was measured after a 1500degreesC anneal. When the implantation was performed at room temperature the C implanted samples showed a significantly higher D-II luminescence than the Si implanted. This makes it tempting to assume that a surplus of C and likely C interstitials are involved in the defect formation. However, when the implantation is done at 600degreesC the difference between Si and C implanted samples almost disappears and a slightly higher D-II intensity can be seen in the Si implanted samples. This effect may be due to the mobility of C interstitials at temperatures above 500degreesC. This clearly demonstrates the effect of hot implantation that there is a major change in D-II PL intensity even after a 1500degreesC anneal.
Place, publisher, year, edition, pages
2003. Vol. 433-4, 345-348 p.
annealing, D-II, ion implantation, SiC
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-48547OAI: oai:DiVA.org:liu-48547DiVA: diva2:269443