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Growth and characterization of Na0.5K0.5NbO3 thin films on polycrystalline Pt80Ir20 substrates
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Biomolecular and Organic Electronics .
Linkoping Univ, Dept Phys, SE-58183 Linkoping, Sweden Swedish Def Res Agcy, FOI, SE-58111 Linkoping, Sweden Royal Inst Technol, Dept Condensed Matter Phys, SE-16440 Stockholm, Sweden.
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2002 (English)In: Journal of Materials Research, ISSN 0884-2914, Vol. 17, no 5, 1183-1191 p.Article in journal (Refereed) Published
Abstract [en]

Na0.5K0.5NbO3 thin films have been deposited onto textured polycrystalline Pt80Ir20 substrates using radio frequency magnetron sputtering. Films were grown in off- and on-axis positions relative to the target at growth temperatures of 500-700 degreesC and sputtering pressures of 1-7 Pa. The deposited films were found to be textured, displaying a mixture of two orientations (001) and (101). Films grown on-axis showed a prefered (001) orientation, while the off-axis films had a (101) orientation. Scanning electron microscopy showed that the morphology of the films was dependent on the substrate position and sputtering pressure. The low-frequency (10 kHz) dielectric constants of the films were found to be in the range of approximately 490-590. Hydrostatic piezoelectric measurements showed that the films were piezoelectric in the as-deposited form with a constant up to 14.5 pC/N.

Place, publisher, year, edition, pages
2002. Vol. 17, no 5, 1183-1191 p.
National Category
Engineering and Technology
URN: urn:nbn:se:liu:diva-48918OAI: diva2:269814
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2013-10-30

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