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Recent developments in plasma assisted physical vapour deposition
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology.
Linkoping Univ, Dept Phys, Thin Film Phys Div, S-58183 Linkoping, Sweden Univ Nebraska, Dept Mech Engn, Lincoln, NE 68588 USA React Sputtering Inc, Santa Barbara, CA 93111 USA Univ Hull, Res Ctr Surface Engn, Hull HU6 7RX, N Humberside, England.
Linkoping Univ, Dept Phys, Thin Film Phys Div, S-58183 Linkoping, Sweden Univ Nebraska, Dept Mech Engn, Lincoln, NE 68588 USA React Sputtering Inc, Santa Barbara, CA 93111 USA Univ Hull, Res Ctr Surface Engn, Hull HU6 7RX, N Humberside, England.
Linkoping Univ, Dept Phys, Thin Film Phys Div, S-58183 Linkoping, Sweden Univ Nebraska, Dept Mech Engn, Lincoln, NE 68588 USA React Sputtering Inc, Santa Barbara, CA 93111 USA Univ Hull, Res Ctr Surface Engn, Hull HU6 7RX, N Humberside, England.
2000 (English)In: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 33, no 18, R173-R186 p.Article, review/survey (Refereed) Published
Abstract [en]

Recent developments in plasma assisted physical vapour deposition (PAPVD) processes an reviewed. A short section on milestones in advances in PAPVD covering the time period from 1938 when the first PAPVD system was patented to the end of the 1980s is followed by a more detailed discussion of some more recent advances, most of which have been related to increases in plasma density. It has been demonstrated that the state of the art PAPVD processes operate in a plasma density range of 10(11) to 10(13) cm(-3). In this range a substantial fraction of the plasma consists of ionized film forming species. Hence, the energy of the condensing film forming species can be directly controlled, as opposed to utilizing indirect energy control with, for example, ionized inert gas bombardment. For a large variety of applications ranging from ceramic film synthesis at conditions far from thermodynamic equilibrium to state of the art metallization technology, such direct energy control of the condensing film forming species is of critical importance, and offers the possibility to engineer the coating microstructure and hence the coating properties.

Place, publisher, year, edition, pages
2000. Vol. 33, no 18, R173-R186 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-49576OAI: oai:DiVA.org:liu-49576DiVA: diva2:270472
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-12

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Schneider, Jochen

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