Magnetic-field-dependent plasma composition of a pulsed arc in a high-vacuum ambient
2000 (English)In: Applied Physics Letters, ISSN 0003-6951, Vol. 76, no 12, 1531-1533 p.Article in journal (Refereed) Published
The effect of a magnetic field on the plasma composition of a pulsed Au plasma stream in a high-vacuum ambient is described. The plasma was formed with a pulsed vacuum-arc-plasma source, and the time-resolved plasma composition was measured with time-of-flight charge-to-mass spectrometry. Plasma impurities due to ionization of nonmetallic species (H+, O+, and N+) were found to be below the detection limit in the absence of a magnetic field. However, in the presence of a magnetic field (0.4 T), the contribution of ionized nonmetal species to the plasma composition was up to 0.22 atomic ratio. These results are characteristic of plasma-based techniques where magnetic fields are employed in a high-vacuum ambient. In effect, the impurity incorporation during thin-film growth pertains to the present findings. (C) 2000 American Institute of Physics. [S0003-6951(00)00712-9].
Place, publisher, year, edition, pages
2000. Vol. 76, no 12, 1531-1533 p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-49824OAI: oai:DiVA.org:liu-49824DiVA: diva2:270720