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Magnetic-field-dependent plasma composition of a pulsed arc in a high-vacuum ambient
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology.
Linkoping Univ, Dept Phys, Film Phys Div, SE-58183 Linkoping, Sweden Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA Royal Inst Technol, Dept Mat Phys, SE-10044 Stockholm, Sweden Linkoping Univ, Dept Phys, Film Phys Div, S-58183 Linkoping, Sweden.
Linkoping Univ, Dept Phys, Film Phys Div, SE-58183 Linkoping, Sweden Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA Royal Inst Technol, Dept Mat Phys, SE-10044 Stockholm, Sweden Linkoping Univ, Dept Phys, Film Phys Div, S-58183 Linkoping, Sweden.
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics.ORCID iD: 0000-0002-2837-3656
2000 (English)In: Applied Physics Letters, ISSN 0003-6951, Vol. 76, no 12, 1531-1533 p.Article in journal (Refereed) Published
Abstract [en]

The effect of a magnetic field on the plasma composition of a pulsed Au plasma stream in a high-vacuum ambient is described. The plasma was formed with a pulsed vacuum-arc-plasma source, and the time-resolved plasma composition was measured with time-of-flight charge-to-mass spectrometry. Plasma impurities due to ionization of nonmetallic species (H+, O+, and N+) were found to be below the detection limit in the absence of a magnetic field. However, in the presence of a magnetic field (0.4 T), the contribution of ionized nonmetal species to the plasma composition was up to 0.22 atomic ratio. These results are characteristic of plasma-based techniques where magnetic fields are employed in a high-vacuum ambient. In effect, the impurity incorporation during thin-film growth pertains to the present findings. (C) 2000 American Institute of Physics. [S0003-6951(00)00712-9].

Place, publisher, year, edition, pages
2000. Vol. 76, no 12, 1531-1533 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-49824OAI: oai:DiVA.org:liu-49824DiVA: diva2:270720
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2016-08-31

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Schneider, JochenHultman, Lars

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