Fractional van der Waals interaction between thin metallic films
2000 (English)In: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, Vol. 61, no 3, 2204-2210 p.Article in journal (Refereed) Published
The van der Waals (vdW) interaction between thin metallic films varies with separation as the separation to a fractional power. This is in contrast to the usual integer-power separation dependence between objects such as atoms, dielectric films, or thick metallic films. We have calculated the free energy of attraction between sheets of gold, silver, copper, beryllium, and tungsten numerically using experimentally found dielectric functions. The results are compared with the corresponding analytical results obtained using simple model dielectric functions. We have investigated how thin the metallic films must be in order for the fractional vdW interaction to be present. To our knowledge, fractional vdW interaction has not yet been confirmed experimentally.
Place, publisher, year, edition, pages
2000. Vol. 61, no 3, 2204-2210 p.
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-49827OAI: oai:DiVA.org:liu-49827DiVA: diva2:270723