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Fractional van der Waals interaction between thin metallic films
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics .
Linköping University, The Institute of Technology. Linköping University, Department of Physics, Chemistry and Biology, Theoretical Physics .ORCID iD: 0000-0002-6281-868X
2000 (English)In: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 61, no 3, 2204-2210 p.Article in journal (Refereed) Published
Abstract [en]

The van der Waals (vdW) interaction between thin metallic films varies with separation as the separation to a fractional power. This is in contrast to the usual integer-power separation dependence between objects such as atoms, dielectric films, or thick metallic films. We have calculated the free energy of attraction between sheets of gold, silver, copper, beryllium, and tungsten numerically using experimentally found dielectric functions. The results are compared with the corresponding analytical results obtained using simple model dielectric functions. We have investigated how thin the metallic films must be in order for the fractional vdW interaction to be present. To our knowledge, fractional vdW interaction has not yet been confirmed experimentally.

Place, publisher, year, edition, pages
2000. Vol. 61, no 3, 2204-2210 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-49827OAI: oai:DiVA.org:liu-49827DiVA: diva2:270723
Available from: 2009-10-11 Created: 2009-10-11 Last updated: 2017-12-12

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Boström, MathiasSernelius, Bo

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