Sample preserving deep interface characterization technique
2006 (English)In: Physical Review Letters, ISSN 0031-9007, Vol. 97, no 26Article in journal (Refereed) Published
We propose a nondestructive technique based on atomic core-level shifts to characterize the interface quality of thin film nanomaterials. Our method uses the inherent sensitivity of the atomic core-level binding energies to their local surroundings in order to probe the layer-resolved binary alloy composition profiles at deeply embedded interfaces. From an analysis based upon high energy x-ray photoemission spectroscopy and density functional theory of a Ni/Cu fcc (100) model system, we demonstrate that this technique is a sensitive tool to characterize the sharpness of a buried interface. We performed controlled interface tuning by gradually approaching the diffusion temperature of the multilayer, which lead to intermixing. We show that core-level spectroscopy directly reflects the changes in the electronic structure of the buried interfaces, which ultimately determines the functionality of the nanosized material. © 2006 The American Physical Society.
Place, publisher, year, edition, pages
2006. Vol. 97, no 26
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-50048DOI: 10.1103/PhysRevLett.97.266106OAI: oai:DiVA.org:liu-50048DiVA: diva2:270944