Dual-magnetron open field sputtering system for sideways deposition of thin films
2010 (English)In: SURFACE and COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 204, no 14, 2165-2169 p.Article in journal (Refereed) Published
A dual-magnetron system for deposition inside tubular substrates has been developed. The two magnetrons are facing each other and have opposing magnetic fields forcing electrons and thereby also ionized material to be transported radially towards the substrate. The depositions were made employing direct current magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HiPIMS). To optimize the deposition rate, the system was characterized at different separation distances between the magnetrons under the same sputtering conditions. The deposition rate is found to increase with increasing separation distance independent of discharge technique. The emission spectrum from the HiPIMS plasma shows a highly ionized fraction of the sputtered material. The electron densities of the order of 10(16) m(-3) and 10(18) m(-3) have been determined in the DCMS and the HiPIMS plasma discharges respectively. The results demonstrate a successful implementation of the concept of sideways deposition of thin films providing a solution for coating complex shaped surfaces.
Place, publisher, year, edition, pages
2010. Vol. 204, no 14, 2165-2169 p.
Dual-magnetron, Open field configuration, Sideways deposition, HiPIMS, HPPMS, DCMS
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-54766DOI: 10.1016/j.surfcoat.2009.11.044ISI: 000275920900009OAI: oai:DiVA.org:liu-54766DiVA: diva2:309862