Age hardening in arc-evaporated ZrAlN thin films
2010 (English)In: Scripta Materialia, ISSN 1359-6462, E-ISSN 1872-8456, Vol. 62, no 10, 739-741 p.Article in journal (Refereed) Published
Zr0.44Al0.56N1.20 films were deposited by reactive arc evaporation on WC-Co substrates. As-deposited films have a defect-rich NaCl-cubic and wurtzite phase mixture. During annealing at 1100 degrees C the films undergo simultaneous recovery of the ZrN-rich c-ZrAlN nanoscale domains and formation of semicoherent w-ZrAlN nanobricks, while the excess nitrogen is released. This process results in an age hardening effect as high as 36%, as determined by nanoindentation. At 1200 degrees C, the w-AlN recrystallizes and the hardening effect is lost.
Place, publisher, year, edition, pages
Amsterdam: Elsevier Science B.V. , 2010. Vol. 62, no 10, 739-741 p.
PVD, Nanoindentation, TEM, Hardness, Thin films
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-54847DOI: 10.1016/j.scriptamat.2010.01.049ISI: 000276295800004OAI: oai:DiVA.org:liu-54847DiVA: diva2:310870