Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering
2010 (English)In: THIN SOLID FILMS, ISSN 0040-6090, Vol. 518, no 15, 4294-4298 p.Article in journal (Refereed) Published
Cr2O3 and (Cr,Al)(2)O-3 films were grown using reactive dc and inductively coupled plasma magnetron sputtering at substrate temperatures of 300-450 degrees C. For pure chromia, alpha-Cr2O3 films with fiber texture were grown; the out-of-plane texture could be controlled from andlt; 0001 andgt; to andlt;10andlt;(1)over barandgt;4andgt;. The former texture was obtained as a consequence of competitive growth with no applied bias or inductively coupled plasma, while the latter was obtained at moderate bias ( - 50 V), probably due to recrystallization driven by ion-bombardment-induced strain. By reactive codeposition of Cr and Al, a corundum-structured metastable solid solution alpha-(Cr,Al)(2)O-3 with Cr/Al ratios of 2-10 was grown with a dense, fine-grained morphology. Hardness and reduced elastic modulus values were in the ranges 24-27 GPa and 190-230 GPa, respectively.
Place, publisher, year, edition, pages
Elsevier Science B.V., Amsterdam. , 2010. Vol. 518, no 15, 4294-4298 p.
Alumina, Chromia, Physical vapor deposition, Coatings, Preferred orientation, X-ray diffraction
National CategoryEngineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-57380DOI: 10.1016/j.tsf.2010.01.008ISI: 000278242000040OAI: oai:DiVA.org:liu-57380DiVA: diva2:325579
K Pedersen, J Bottiger, M Sridharan, M Sillassen and Per Eklund, Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering, 2010, THIN SOLID FILMS, (518), 15, 4294-4298.
Copyright: Elsevier Science B.V., Amsterdam.