Growth and structural properties of Mg:C thin films prepared by magnetron sputtering
2010 (English)In: THIN SOLID FILMS, ISSN 0040-6090, Vol. 518, no 15, 4225-4230 p.Article in journal (Refereed) Published
We investigate the growth and structure properties of Mg:C thin films. The films are prepared using a dc magnetron sputtering discharge where the electrical resistance over the films is monitored during growth in-situ with a four point probe setup. The structural properties of the films are investigated using X-ray diffraction measurements and the elemental composition and binding in the films is determined using elastic recoil detection analysis and X-ray photoelectron spectroscopy. The results show that during co-sputtering the carbon flux influences the initial stages of the film growth. The films are made of polycrystalline magnesium grains embedded in a carbon network, the size of which depends on the carbon content, but amorphous phases cannot be excluded. The XPS measurements show the presence of carbidic carbon whereas X-ray measurements find no Mg:C phases. The overall stability of the films is found to depend on the carbon content, where stable films capped with a 14 nm Pd layer cannot be obtained with carbon content above 18%.
Place, publisher, year, edition, pages
Elsevier Science B.V., Amsterdam. , 2010. Vol. 518, no 15, 4225-4230 p.
Magnesium, Carbon, In-situ resistance measurements, X-ray photoelectron spectroscopy, Magnetron sputtering, X-ray diffraction, Elastic recoil detection analysis
Engineering and Technology
IdentifiersURN: urn:nbn:se:liu:diva-57379DOI: 10.1016/j.tsf.2009.12.082ISI: 000278242000028OAI: oai:DiVA.org:liu-57379DiVA: diva2:325581