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Industrial-scale deposition of highly adherent CNx films on steel substrates
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.ORCID iD: 0000-0003-3277-1945
Res Inst Tech Phys and Mat Sci,Budapest.
Linköping University, Department of Physics, Chemistry and Biology. Linköping University, The Institute of Technology.ORCID iD: 0000-0002-4898-5115
Sandvik Tooling RandD.
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2010 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 204, no 21-22, 3349-3357 p.Article in journal (Refereed) Published
Abstract [en]

Highly adherent carbon nitride (CNx) films were deposited using a novel pretreatment with two high power impulse magnetron sputtering (HIPIMS) power supplies in a master-slave configuration: one to establish the discharge and one to produce a pulsed substrate bias. During the pretreatment, SKF3 (AISI 52100) steel substrates were pulse-biased in the environment of a HIPIMS Cr plasma in order to sputter clean the surface and to implant Cr metal ions. Subsequently. CNx films were prepared at room temperature by DC unbalanced magnetron sputtering from a high purity graphite target in a N-2/Ar discharge at 3 mTorr. All processing was done in an industrial CemeCon CC800 system. A series of depositions were obtained with samples at different bias voltages (DC and pulsed) in the range of 0-800 V. Scanning transmission microscopy (STEM) and high resolution transmission electron microscopy (HRTEM) show the formation of an interface comprising a polycrystalline Cr layer of 100 nm and an amorphous transition layer of 5 nm. The adhesion of CNx films evaluated by the Daimler-Benz Rockwell-C reach strength quality HF1, and the scratch tests gives critical loads of 84 N. Adhesion results are correlated to the formation of an optimal interfacial mixing layer of Cr and steel.

Place, publisher, year, edition, pages
Elsevier Science B.V., Amsterdam. , 2010. Vol. 204, no 21-22, 3349-3357 p.
Keyword [en]
Carbon nitride; HIPIMS; HPPMS; Adhesion; CNx
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-58178DOI: 10.1016/j.surfcoat.2010.03.038ISI: 000279696400001OAI: oai:DiVA.org:liu-58178DiVA: diva2:342898
Note
Original Publication: Esteban Broitman, Zs. Czigany, Grzegorz Greczynski, J. Bohlmark, R. Cremer and Lars Hultman, Industrial-scale deposition of highly adherent CNx films on steel substrates, 2010, Surface & Coatings Technology, (204), 21-22, 3349-3357. http://dx.doi.org/10.1016/j.surfcoat.2010.03.038 Copyright: Elsevier Science B.V., Amsterdam. http://www.elsevier.com/ Available from: 2010-08-11 Created: 2010-08-09 Last updated: 2017-12-12

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Broitman, EstebanGreczynski, GrzegorzHultman, Lars

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