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Formation of epitaxial CoSi2 films on Si and on Si/Si80Ge20 (100) by reactive deposition epitaxy
KFKI Research Institute for Technical and Materials Science.
KFKI Research Institute for Technical and Materials Science.
KFKI Research Institute for Technical and Materials Science .
KFKI Research Institute for Technical and Materials Science.
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2002 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 81, no 1, 37-39 p.Article in journal (Refereed) Published
Abstract [en]

CoxTi1-x layers were deposited on Si (100) and on Si/Si80Ge20 (100) capped with 30- or 40-nm-thick Si at 650 degreesC substrate temperature at 1x10(-6) Pa pressure. The Co-silicide films grown by reactive deposition epitaxy were characterized by Rutherford backscattering-channeling, x-ray difraction, by depth profile analysis of the components, and by sheet resistance measurements. The Ti content of the deposited Co layers was between 0.1 and 8 at. %. The epitaxy of the layers on Si and on Si/Si80Ge20 improved by increasing the Ti concentration. The minimum yield of the channeling and the full width at half maximum value of the rocking curve of CoSi2 decreased. The sheet resisitance of the formed layers was also minimal in these cases. The method applied is promising to form epitaxial CoSi2 layers on SixGe1-x substrates.

Place, publisher, year, edition, pages
American Institute of Physics , 2002. Vol. 81, no 1, 37-39 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-59156DOI: 10.1063/1.1491012ISI: 000176426000013OAI: oai:DiVA.org:liu-59156DiVA: diva2:350190
Available from: 2010-09-10 Created: 2010-09-09 Last updated: 2017-12-12

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Willander, Magnus

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