Deposition of epitaxial Ti2AlC thin films by pulsed cathodic arc
2007 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 101, no 5, 056101- p.Article in journal (Refereed) Published
A multicathode high current pulsed cathodic arc has been used to deposit Ti2AlC thin films belonging to the group of nanolaminate ternary compounds of composition M(n+1)AX(n). The required stoichiometry was achieved by means of alternating plasma pulses from three independent cathodes. We present x-ray diffraction and transmission electron microscopy analysis showing that epitaxial single phase growth of Ti2AlC has been achieved at a substrate temperature of 900 degrees C. Our results demonstrate a powerful method for MAX phase synthesis, allowing for phase tuning within the M(n+1)AX(n) system.
Place, publisher, year, edition, pages
American Institute of Physics , 2007. Vol. 101, no 5, 056101- p.
National CategoryMedical and Health Sciences
IdentifiersURN: urn:nbn:se:liu:diva-59689DOI: 10.1063/1.2709571ISI: 000244945400172OAI: oai:DiVA.org:liu-59689DiVA: diva2:353070