liu.seSearch for publications in DiVA
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Reducing the impurity incorporation from residual gas by ion bombardment during high vacuum magnetron sputtering
Rhein Westfal TH Aachen.
Uppsala University.
Uppsala University.
Research Center Rossendorf.
Show others and affiliations
2006 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 88, no 19, 191905- p.Article in journal (Refereed) Published
Abstract [en]

The influence of ion energy on the hydrogen incorporation has been investigated for alumina thin films, deposited by reactive magnetron sputtering in an Ar/O-2/H2O environment. Ar+ with an average kinetic energy of similar to 5 eV was determined to be the dominating species in the plasma. The films were analyzed with x-ray diffraction, x-ray photoelectron spectroscopy, and elastic recoil detection analysis, demonstrating evidence for amorphous films with stoichiometric O/Al ratio. As the substrate bias potential was increased from -15 V (floating potential) to -100 V, the hydrogen content decreased by similar to 70%, from 9.1 to 2.8 at. %. Based on ab initio calculations, these results may be understood by thermodynamic principles, where a supply of energy enables surface diffusion, H-2 formation, and desorption [Rosen , J. Phys.: Condens. Matter 17, L137 (2005)]. These findings are of importance for the understanding of the correlation between ion energy and film composition and also show a pathway to reduce impurity incorporation during film growth in a high vacuum ambient.

Place, publisher, year, edition, pages
American Institute of Physics , 2006. Vol. 88, no 19, 191905- p.
National Category
Medical and Health Sciences
Identifiers
URN: urn:nbn:se:liu:diva-59684DOI: 10.1063/1.2193044ISI: 000237477400024OAI: oai:DiVA.org:liu-59684DiVA: diva2:353081
Available from: 2010-09-23 Created: 2010-09-23 Last updated: 2017-12-12

Open Access in DiVA

No full text

Other links

Publisher's full text

Authority records BETA

Rosen, JohannaMusic, D

Search in DiVA

By author/editor
Rosen, JohannaMusic, D
In the same journal
Applied Physics Letters
Medical and Health Sciences

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 293 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • oxford
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf