Thermal stability and mechanical properties of arc evaporated ZrN/ZrAlN multilayers
2010 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 519, no 2, 694-699 p.Article in journal (Refereed) Published
ZrN1.20/Zr0.44Al0.56N1.20 multilayer films as well as ZrN1.17 and Zr0.44Al0.56N1.20 films were deposited by reactive arc evaporation on WC–Co substrates. Samples were post-deposition annealed for 2 h at 800–1200 °C. As-deposited and heat treated films were characterized by scanning transmission electron microscopy, X-ray diffraction and nanoindentation. The thermal stability was studied using a combination of differential scanning calorimetry, thermogravimetry, and mass spectrometry. The as-deposited Zr0.44Al0.56N1.20 film exhibits a nanocomposite structure of cubic and wurtzite ZrAlN. During annealing, the formation of ZrN- and AlN-rich domains results in age hardening of both the Zr0.44Al0.56N1.20 and the ZrN/ZrAlN multilayers. The age hardening is enhanced in the ZrN/ZrAlN multilayer due to straining of the ZrAlN sublayers in which a maximum hardness of 31 GPa is obtained after annealing at 1100 °C.
Place, publisher, year, edition, pages
Elsevier , 2010. Vol. 519, no 2, 694-699 p.
Thin films; Zr-Al-N; Multilayer; Arc evaporation; TEM; Hardness
IdentifiersURN: urn:nbn:se:liu:diva-62984DOI: 10.1016/j.tsf.2010.08.119ISI: 000284499500025OAI: oai:DiVA.org:liu-62984DiVA: diva2:375457