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XPS study of palladium sensitized nano porous silicon thin film
Jadavpur University.
Linköping University, Department of Physics, Chemistry and Biology, Molecular Surface Physics and Nano Science. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Molecular Surface Physics and Nano Science. Linköping University, Faculty of Science & Engineering.
Linköping University, Department of Physics, Chemistry and Biology, Molecular Surface Physics and Nano Science. Linköping University, Faculty of Science & Engineering.
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2010 (English)In: BULLETIN OF MATERIALS SCIENCE, ISSN 0250-4707, Vol. 33, no 6, 647-651 p.Article in journal (Refereed) Published
Abstract [en]

Nano porous silicon (PS) was formed on p-type monocrystalline silicon of 2-5 Omega cm resistivity and (100) orientation by electrochemical anodization method using HF and ethanol as the electrolytes. High density of surface states, arising due to its nano structure, is responsible for the uncontrolled oxidation in air and for the deterioration of the PS surface with time. To stabilize the material PS surface was modified by a simple and low cost chemical method using PdCl2 solution at room temperature. X-ray photoelectron spectroscopy (XPS) was performed to reveal the chemical composition and the relative concentration of palladium on the nanoporous silicon thin films. An increase of SiO2 formation was observed after PdCl2 treatment and presence of palladium was also detected on the modified surface. I-V characteristics of Al/PS junction were studied using two lateral Al contacts and a linear relationship was obtained for Pd modified PS surface. Stability of the contact was studied for a time period of around 30 days and no significant ageing effect could be observed.

Place, publisher, year, edition, pages
Indian Academy of Sciences; 1999 / Indian Academy of Sciences, Springer , 2010. Vol. 33, no 6, 647-651 p.
Keyword [en]
Porous silicon, passivation, palladium, oxidation, XPS
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-67029DOI: 10.1007/s12034-011-0138-9ISI: 000288185200001OAI: oai:DiVA.org:liu-67029DiVA: diva2:406282
Available from: 2011-03-25 Created: 2011-03-25 Last updated: 2015-05-29

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Selegård, LinnéaVahlberg, CeciliaUvdal, Kajsa

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