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Oxygen as a poison or promoter in the catalytic dissociation of H2, C2H2, C2H4, and NH3 on palladium
Linköping University, Department of Physics, Chemistry and Biology, Applied Physics . Linköping University, The Institute of Technology.
Linköping University, Department of Physics, Chemistry and Biology, Applied Physics . Linköping University, The Institute of Technology.
1986 (English)In: Applied Surface Science, ISSN 0169-4332, E-ISSN 1873-5584, Vol. 27, 275- p.Article in journal (Refereed) Published
Abstract [en]

The dissociation rates of H2, C2H4, C2H4, and NH3 have been studied on oxygen covered Pd surfaces by measuring the water desorption rates during exposure to each of the molecules. These results are correlated with the hydrogen response of a Pd-MOS structure. The measurements show a trend (at 473 K) where oxygen blocks H2 dissociation, blocks C2H4 dissociation only above a certain oxygen coverage, has no influence on C2H2 dissociation, and promotes NH3 dissociation.

Place, publisher, year, edition, pages
1986. Vol. 27, 275- p.
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Physical Sciences
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URN: urn:nbn:se:liu:diva-67280DOI: 10.1016/0169-4332(86)90133-9OAI: oai:DiVA.org:liu-67280DiVA: diva2:409132
Available from: 2011-04-07 Created: 2011-04-07 Last updated: 2017-12-11

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Dannetun, HelenLundström, Ingemar

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