Post fabrication annealing effects on electrical and optical characteristics of n-ZnO nanorods/p-Si heterojunction diodes
(English)Manuscript (preprint) (Other academic)
Annealing effects on optical and electrical properties of n-ZnO/p-Si heterojunction diodes are studied. ZnO nanorods are grown on p-Si substrate by aquous chemical growth technique. As grown samples were annealed at 400 and 600 oC in air, oxygen and nitrogen ambient. Structural, optical and electrical characteristics are studied by Scanning Electron Microscopy (SEM), Photoluminescence (PL), Current–Voltage (I-V) and Capacitance-Voltage (CV) measurements. Well aligned hexagonal–shaped vertical nanorods are revealed in SEM. PL spectra indicated higher ultraviolet to visible emission ratio with a strong peak ofnear band edge emission (NBE) and weak broad deep-level emissions (DLE). For device fabrication Al/Pt non-alloyed ohmic contacts have been evaporated. I-V characteristics indicate that annealing in air and oxygen resulted in better rectifying behavior as well as decrease in reverse leakage current. An improvement in PL intensity has been shown by the samples annealed at 400 oC.
heterojunction diodes, ZnO on Si, electrical properties, ZnO nanorods
IdentifiersURN: urn:nbn:se:liu:diva-68074OAI: oai:DiVA.org:liu-68074DiVA: diva2:416040