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High-temperature stability of alpha-Ta(4)AlC(3)
Drexel University.
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.ORCID iD: 0000-0003-1785-0864
Linköping University, Department of Physics, Chemistry and Biology, Thin Film Physics. Linköping University, The Institute of Technology.
Drexel University.
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2011 (English)In: Materials research bulletin, ISSN 0025-5408, E-ISSN 1873-4227, Vol. 46, no 7, 1088-1091 p.Article in journal (Refereed) Published
Abstract [en]

Cold-pressed alpha-Ta(4)AlC(3) powders were annealed up to 1750 degrees C to test first-principles predictions of alpha-beta phase-stability reversal at 1600 degrees C. Up to 1600 degrees C, the alpha-Ta(4)AlC(3) samples were stable with no indications of any alpha-beta transformation, as shown by the strong characteristic X-ray diffraction peaks of alpha-Ta(4)AlC(3) and the zigzag stacking observed by transmission electron microscopy. These results show that, in this experimental situation, high temperature alone is not sufficient to cause the alpha-beta transformation.

Place, publisher, year, edition, pages
Elsevier Science B.V., Amsterdam. , 2011. Vol. 46, no 7, 1088-1091 p.
Keyword [en]
X-ray diffraction (XRD); Transmission electron microscopy (TEM); Polymorphic
National Category
Engineering and Technology
URN: urn:nbn:se:liu:diva-69826DOI: 10.1016/j.materresbull.2011.03.005ISI: 000292122200018OAI: diva2:433525
Original Publication: Nina J. Lane, Per Eklund, Jun Lu, Charles B. Spencer, Lars Hultman and Michel W. Barsoum, High-temperature stability of alpha-Ta(4)AlC(3), 2011, Materials research bulletin, (46), 7, 1088-1091. Copyright: Elsevier Science B.V., Amsterdam. Available from: 2011-08-10 Created: 2011-08-08 Last updated: 2015-01-13

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