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High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
Materials Chemistry, RWTH Aachen University, Germany.ORCID iD: 0000-0003-2864-9509
Sulzer Metaplas GmbH, Germany.
University of Mons, Belgium.
2010 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 204, no 11, 1661-1684 p.Article, review/survey (Refereed) Published
Abstract [en]

High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike. HPPMS, also known as HIPIMS (high power impulse magnetron sputtering), is a physical vapor deposition technique in which the power is applied to the target in pulses of low duty cycle (less than10%) and frequency (less than10 kHz) leading to pulse target power densities of several kW cm(-2). This mode of operation results in generation of ultra-dense plasmas with unique properties, such as a high degree of ionization of the sputtered atoms and an off-normal transport of ionized species, with respect to the target. These features make possible the deposition of dense and smooth coatings on complex-shaped substrates, and provide new and added parameters to control the deposition process, tailor the properties and optimize the performance of elemental and compound films.

Place, publisher, year, edition, pages
Elsevier , 2010. Vol. 204, no 11, 1661-1684 p.
Keyword [en]
National Category
Engineering and Technology
URN: urn:nbn:se:liu:diva-71477DOI: 10.1016/j.surfcoat.2009.11.013ISI: 000275391200001OAI: diva2:450214
Available from: 2011-10-20 Created: 2011-10-20 Last updated: 2014-10-29

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Sarakinos, Kostas
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