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Growth of tio(x) films magnetron sputtering by high power pulsed from a compound tio(1.8) target
Institute of Physics (IA), RWTH Aachen University, Germany.ORCID iD: 0000-0003-2864-9509
University of Aachen, Germany.
University of Aachen, Germany.
University of Aachen, Germany.
2007 (English)In: REVIEWS ON ADVANCED MATERIALS SCIENCE, ISSN 1606-5131, Vol. 15, no 1, 44-48 p.Article in journal (Refereed) Published
Abstract [en]

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO(x) (x greater than 1.8) films from a ceramic TiO(1.8) target in an Ar-O(2) ambient. The film properties have been compared to those deposited by dc magnetron sputtering (dcMS). Both HPPMS and dcMS films exhibit an amorphous structure and are transparent. Furthermore, films grown by HPPMS have improved properties, such as higher density, higher refractive index and smoother film surface, as compared to those deposited by dcMS.

Place, publisher, year, edition, pages
INST PROBLEMS MECHANICAL ENGINEERING-RUSSIAN ACAD SCIENCES , 2007. Vol. 15, no 1, 44-48 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:liu:diva-71501ISI: 000250547100008OAI: oai:DiVA.org:liu-71501DiVA: diva2:450297
Available from: 2011-10-20 Created: 2011-10-20 Last updated: 2014-10-29

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Sarakinos, Kostas

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