MAX phase materials have unique properties that combine metals and ceramics.These properties stems from the complex structure with extremely strong M-Xbonds and weaker M-A bonds. Physical vapor deposition in form of magnetronsputtering is widely used for thin film syntheses. High Power Impulse MagnetronSputtering (HIPIMS) was introduced in the mid-90s, today it is a state of the artthin film deposition method for researchers all over the world.Combinatorial sputter deposition of Cr₂AlC with HIPIMS and direct currentmagnetron sputtering of the chromium target were compared. Aluminum andcarbon were sputtered from individual targets with a shield in between of thethree targets, making the combinatorial method possible.X-ray diffraction showed that Cr₂AlC was present at 550^oC and scanning elec-tron microscopy showed that there was not big difference in the morphology. Elec-trical measurements indicated that the film deposited with HIPIMS had a signif-icant higher electrical conductivity compared to the film deposited with directcurrent. x-ray photoelectron Spectroscopy gives an idea of the composition of thefilm, in one position there were oxygen through the film, the rest were dense films.By using a combinatorial approach Cr₂Al was also found in the films. The twofilms compared deposited with different methods, showed small differences but notthe ones expected.